Complex Oxide Sim for Si

Recipe

Sets temperature and ambient, and the anneal where the recipe has one. Editing any of them switches back to Custom.

Duration

0.25 h48 h

Target thickness

add nm total nm

Enter either one and the duration is solved to hit it. The two differ by the starting oxide, so setting one fills in the other.

Ambient

Wafer orientation

Oxidant pressure

atm

Starting oxide

Defaults to 15 nm. Type any value, or pick 0, 5, 10 or 15 nm.

Freeze-in Unload at the end of oxidation Anneal first, then unload

Model Deal-Grove Massoud (dry O₂ only) Compare both models Deal & Grove's x_i = 25 nm offset

Their dry-O₂ data only fits the linear-parabolic law if the curve is shifted to start at 25 nm, which is why plain Deal-Grove is invalid for thin dry oxides. Turning this on reproduces their published dry fit; it is off by default.

Engine (a) JavaScript (b) Rust → WebAssembly Compare both

WebAssembly engine not built. Run scripts/build-wasm.sh.

Results update automatically whenever a setting changes.

Execute run

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Furnace now—

Next—

Oxidation

Elapsed00:00:00

Remaining00:00:00

Started: —
Alarm at: —

	Now (est.)	At end
Total thickness
Oxide grown
Si consumed

Estimates come from the selected model (per face). The run is saved in this browser, so reloading the page keeps the clock running.

Oxide colour chart

Oxide thickness vs time

Deal-Grove and Massoud are reference models. The field-assisted / kinetic Monte Carlo model is not built yet.

Show Total thickness (blue) Oxide grown (green) Si consumed (red)

Layout

Y scale Linear Log

Y labels nm (0.1, 1, 10) nm (10ⁿ)

Show all calculations Show cross section

Complex Oxide Sim for Si

Execute run

Oxide colour chart

Oxide thickness vs time

Silicon consumed (volume lost per unit area)

README